Vacuum Installation VTT PLASMA M3 IS1 for drawing thin-film coverings of Al on substrates from Si
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- In detail
- BrandVTT
- Country of manufactureBelarus
- ColorGrey
The vacuum VTT PLASMA M3 IS1 installation for drawing in vacuum of thin - film coverings of Al on substrates from Si in the magnetron way with preliminary cleaning with an ionic source.
Installation provides uniform drawing coverings on one lateral surface of a plate, 125 mm by 125 mm in size, plate thickness 220±20µm, at simultaneous loading of 300 products.
Vacuum installation has to be operated on production sites and in laboratories at a temperature of air from 17 to 25ºС, relative humidity of air from 40 to 75% and atmospheric pressure 84,0 * 10 ³ - 106,0 * 10³pa.
Use of installation for drawing decorative coverings on products from various materials is possible.
Yours faithfully, director of the enterprise
Vasily Semenovich
ph. mob: 375 (29) 6154641
skype: vvs_12
e - mail: vactt@mail. ru
TECHNICAL CHARACTERISTICS.
1. Internal size of a chamber: D=1060 mm, H=2370.
2. Limit residual vacuum of 9х10 - 4 Pas in a chamber.
3. The power consumed by installation:
- in the pumping mode - 12 kW;
- in the mode of cleaning and drawing a covering - to 60 kW. (depending on quantity of at the same time used sources)
STRUCTURE OF INSTALLATION.
| No. of a payment order | Name | Quantity. |
| 1. | Magnetron source with the power supply unit.
Size of a target, mm Power supply unit - category current, move, And |
3 pieces.
2230 * 100 * 10. 3 pieces. 40 |
| 2. | Ionic source
- working zone, mm - category current, And - working tension, In |
1
2100 * 70 0.7 |
| 3. | Industrial equipment of drum type.
Quantity of at the same time loaded products of 125 * 125 mm in size (the option of industrial equipment directly under the customer's products is possible) |
2 sets.
300 pieces. |
| 4. | Forvacuum Okta 500 / HENA 300 (PFEIFFER) unit | 1 |
| 5. | High - vacuum otkachny the module on the basis of the diffusive pump NVDM - 400 | 1 |
| 6. | Lock high - vacuum Du 400 air - controlled and possibility of a drosselirovaniye of pumping | 1 |
| 7. | Heaters managements with the temperature of substrate, intra chamber with an opportunity, up to 400 ˚ Page. | 4 |
| 8. | Vacuum sensors:
- PFEIFFER IKR 251 - PFEIFFER PKR 251 - PFEIFFER TPR 280 |
1 1 2 |
| 8. | Control of thickness of coverings:
- Quartz controller of thickness. - Control of resistance on a sample. |
1 1 |
| 8 | System pneumatic on the basis of the SMC elements | 1 |
| 9 | System hydraulic on the basis of the SMC elements | 1 |
| 10 | System automatic supply of technological gases with a possibility of work along with 4 - 8 gases | 1 |